The EVK HELIOS hyperspectral imaging systems are powerful analysis systems, based on non-contact and non-destructive near-infrared imaging spectroscopy. The cameras convince as spatially resolved real-time measurement systems with powerful data processing and high-precision signal processing for analytical, industrial applications. EVK HELIOS hyperspectral imaging systems are measuring systems specifically designed for industrial working conditions and has been created in close cooperation with partners from the mechanical and plant engineering industry. Due to the stable optomechanical design for real industrial temperature conditions, machine designs and fields of application, as well as data processing and algorithms specially developed for analytics, EVK HELIOS enables an optimized analysis directly in the process line. Spatial resolution in real-time: The workflow in which the system is configured, chemometric models are created and transferred with the help of the software EVK SQALAR, is seamless. The evaluation takes place completely in the EVK HELIOS system, whereby no external evaluation systems are required. However, a connection to already existing evaluation systems is easily possible via GigE Vision/GenICam. EVK HELIOS EQ32 is equipped with 320 pixels spatial resolution, measuring in the wavelength range of 930 - 1700 nm and thereby scans with a frame rate of 446Hz full frame. Customers are supported by the EVK Professional Services team from application development to the fully integrated EVK HELIOS system on-site. EVK thus enables the integration of state-of-the-art real-time analysis systems in the shortest possible time in order to successfully equip industrial processing lines for the future and thus exploit the full potential of the applications.